Topic: Electronic Devices and Circuits
Silicon dioxide is used in ICs
- A. Because it facilitates the penetration of diffurants
- B. Because of its high heat conduction
- C. To control the location of diffusion and to protect and insulate the Si Surface
- D. To control the concentration of diffurants
Answer: C. To control the location of diffusion and to protect and insulate the Si Surface
Explanation: In IC fabrication, the $\text{SiO}_2$ layer serves as a high-quality insulating layer, provides surface passivation to protect the silicon surface, and acts as a photomask to selectively block dopants and control the location of diffusion.